As a Senior RF Engineer at AAT, you will operate at the critical intersection of high-frequency power electronics and advanced plasma physics. You will serve as the technical authority for AAT’s RF delivery architecture, driving clean-sheet design, dynamic impedance matching, and plasma source characterization to enable sub-angstrom profile precision in next-generation Atomic Layer Etching (ALE) chambers.
What You'll Do
- Support RF & Plasma tool development/qualification and implementation in Plasma Etch chambers for R&D and Production applications
- Conduct experiments and characterizations of RF & Plasma systems and components at bench and tool levels using various instruments including Network Analyzers, Spectrum Analyzer, Plasma Probes, analog and digital data acquisition controllers.
- Develop new methods to distribute RF through antennas and networks to ignite stable plasmas using different frequency and Generators.
- Develop new RF & Plasma arc detection and diagnostic methods to be used in R&D and Production applications.
- Work with Process Engineers and Field/Customer support teams to provide RF & Plasma support to quickly troubleshoot and resolve field/customer issues.
Job Description
- Masters or PhD in science or engineering areas with emphasis on high frequency electronics or plasma physics.
- Experience with a wide range of plasmas (DC~MW, various pressure and gas conditions).
- Knowledge of unique challenges in large area plasma production and the techniques used in the industry.
- Knowledge in plasma diagnostics (Langmuir probes, optical diagnostic, microwave diagnostic etc.).
- Knowledge in Etch or CVD technology, applications, and film metrology.
- Experience in mechanical design (manufacturability, mechatronics, material properties, vacuum systems, gas flow etc.)
- Experience with system design and module integration on system level (PLCs, IoT, Edge, safety)
- Solid background in RF power delivery, impedance matching, RF sensors, transmission line theory, electronic circuits, amplifiers, sensors etc.




